| 000 | 01172cam a2200277 a 4500 | ||
|---|---|---|---|
| 001 | 1877588 | ||
| 005 | 20260615075603.0 | ||
| 008 | 830420s1983 gw a b 101 0 eng | ||
| 010 | _a 83006689 | ||
| 020 | _a0387124918 (U.S.) | ||
| 040 |
_aDLC _cBSU _dBSULIB |
||
| 050 | 0 | 0 |
_aTK7871.85 _b.I5864 1983 |
| 082 | 0 | 0 |
_a621.3815 _222 _b ION |
| 245 | 0 | 0 |
_aIon implantation : _bequipment and techniques : proceedings of the Fourth International Conference, Berchtesgaden, Fed. Rep. of Germany, September 13-17, 1982 / _ceditors, H. Ryssel and H. Glawischnig. |
| 260 |
_aBerlin: _aNew York: _bSpringer-Verlag, _c1983. |
||
| 300 |
_ax, 556 p. : _bill. ; _c24 cm. |
||
| 440 | 0 |
_aSpringer series in electrophysics ; _vv. 11 _911366 |
|
| 504 | _aIncludes bibliographical references and index. | ||
| 650 | 0 |
_aIon implantation _xCongresses. _911367 |
|
| 650 | 0 |
_aSemiconductor doping _xCongresses. _911368 |
|
| 658 | _aEngineering | ||
| 700 | 1 |
_aRyssel, Heiner, _d1941- _911369 |
|
| 700 | 1 |
_aGlawischnig, H. _q(Hans), _d1939- _911370 |
|
| 711 | 2 |
_aInternational Conference on Ion Implantation: Equipment and Techniques _n(4th : _d1982 : _cBerchtesgaden, Germany) _911371 |
|
| 942 |
_2ddc _cBK |
||
| 999 |
_c5376 _d5376 |
||